GaNAs alloy is grown by metalorganic chemical vapor deposition (MOCVD) using dimethylhydrazine (DMHy) as the nitrogen precursor.High resolution X ray diffraction (HRXRD) and secondary ion mass spectro metry (SIMS) are combined in determining the nitrogen contents in the samples.Room temperature photoluminescence (RTPL) measurement is also used in characterizing.The influence of different Ga precursors on GaNAs quality is investigated.Samples grown with triethylgallium (TEGa) have better qualities and less impurity contamination than those with trimethylgallium (TMGa).Nitrogen content of 5 688% is achieved with TEGa.The peak wavelength in RTPL measurement is measured to be 1278 5nm.
在Si(001)衬底上,以高质量的弛豫Ge薄膜作为缓冲层,先后生长Sn组分x分别为2.5%,5.2%和7.8%的完全应变的三层Ge_(1-x)Sn_x合金薄膜.在Si(001)衬底上直接生长了x分别为0.005,0.016,0.044,0.070和0.155的五个弛豫Ge_(1-x)Sn_x样品.通过卢瑟福背散射谱、高分辨X射线衍射和X射线倒易空间图等方法测量了Ge_(1-x)Sn_x合金的组分与晶格常数.实验得到的晶格常数相对Vegard定律具有较大的正偏离,弯曲系数b=0.211 A.
