We theoretically study the influence of spacer layer thickness fluctuation(SLTF) on the mobility of a twodimensional electron gas(2DEG) in the modulation-doped Al x Ga 1 x As/GaAs/Al x Ga 1 x As quantum well.The dependence of the mobility limited by SLTF scattering on spacer layer thickness and donor density are obtained.The results show that SLTF scattering is an important scattering mechanism for the quantum well structure with a thick well layer.
To further understand the energy loss mechanism of the "charge transfer process" that was proposed in our previous work on Eu2+-Mn2+ co-doped phosphors, the influence of synthetic temperature and heating time on the photoluminescence(PL) behavior of M5(PO4)3Cl:Eu2+,Mn2+(M=Ca, Sr) phosphors was investigated by analyzing their PL spectra and decay curves. For the Ca phase, an increase in the synthetic temperature resulted in an increase in the loss from the "charge transfer process" since more Eu2+ ions were involved in the Eu2+-Mn2+ clusters. This was contrary to the thermodynamic expectation. To solve this contradiction, we proposed that the formation of Eu2+-Mn2+ clusters was kinetically blocked at lower synthetic temperatures. With an increase in heating time for the phosphors synthesized at lower temperature(such as 1100 ℃) the PL intensity decreased, which supported the above assertion.
为了满足光电探测仪器校准修正过程中对标准光源的要求,设计了一种采用积分球技术,通过纽扣电池供电的便携式漫反射LED均匀光源。给出了光源的装配图、主要零件3D图及电路图,并对其进行了详细说明。通过Matlab分析光源出光口CCD照片各像素的灰度值,得到出光口ф14mm范围内光强均匀度为95.1%;采用Ocean Optics USB 2000+型光谱仪分析光源出光口光强均匀性及漫反射性,得到沿出光口径方向2个位置光强与中心光强相比,分别下降了2.93%和6.30%的结果。光源出光口平面旋转10°,中心位置光强下降6.30%。测试分析表明:设计的光源具有较好的均匀度和漫反射性,在光电探测仪器校准方面具有一定的应用价值。
The electron mobility limited by the interface and surface roughness scatterings of the two-dimensional electron gas in AlxGa1-xN/GaN quantum wells is studied. The newly proposed surface roughness scattering in the AlGaN/GaN quantum wells becomes effective when an electric field exists in the AlxGa1-xN barrier. For the AlGaN/GaN potential well, the ground subband energy is governed by the spontaneous and the piezoelectric polarization fields which are determined by the barrier and the well thicknesses. The thickness fluctuation of the AlGaN barrier and the GaN well due to the roughnesses cause the local fluctuation of the ground subband energy, which will reduce the 2DEG mobility.
Group Ⅲ-nitride material system possesses some unique properties,such as large spectrum coverage from infrared to deep ultraviolet,wide energy band gap,high electron saturation velocity,high electrical breakdown field,and strong polarization effect,which enables the big family has a very wide application range from optoelectronic to power electronic area.Furthermore,the successful growth of GaN-related III-nitride material on large size silicon substrate enable the above applications easily realize the commercialization,because of the cost-effective device fabrication on the platform of Si-based integrated circuits.In this article,the progress and development of the GaN-based materials and light-emitting diodes grown on Si substrate were summarized,in which some key issues regarding to the material growth and device fabrication were reviewed.
The effect of high-temperature annealing on AlN thin film grown by metalorganic chemical vapor deposition was investigated using atomic force microscopy, Raman spectroscopy, and deep ultra-violet photoluminescence(PL) with the excitation wavelength as short as ～ 177 nm. Annealing experiments were carried out in either N2 or vacuum atmosphere with the annealing temperature ranging from 1200℃ to 1600℃. It is found that surface roughness reduced and compressive strain increased with the annealing temperature increasing in both annealing atmospheres. As to optical properties,a band-edge emission peak at 6.036 eV and a very broad emission band peaking at about 4.7 eV were observed in the photoluminescence spectrum of the as-grown sample. After annealing, the intensity of the band-edge emission peak varied with the annealing temperature and atmosphere. It is also found that a much stronger emission band ranging from 2.5 eV to 4.2 eV is superimposed on the original spectra by annealing in either N2 or vacuum atmosphere. We attribute these deep-level emission peaks to the VAL–ONcomplex in the AlN material.
