Characteristics of plasmonic wave propagating in nanocavity formed by two silver films are studied numerically. The groove etched inside wall of the top film makes it possible to control the propagation when light goes through the top film along a nanoslit into the cavity. It is found that the transmission wave through the channel of groove etched side can be filtered linearly with the groove of a certain depth; while the other side is still open for this wave and its intensity can be enhanced periodically with the variable groove position in both films, which are explained well based on the interference of plasmonic waves in the system.
Indentations etched on the output surface of a metallic mask are proposed to produce fine lithographic patterns with a resolution of 500 nm using the finite-difference time domain （FDTD） method. Such a designed mask is capable of enhancing near field lithography （NFL） resolution more than three times compared with the structure without indentations. The simulation results show that the interference disturbance between the adjacent lithographic channels can be eliminated efficiently by employing the indentations. As a straightforward consequence, the channel-to-channel interspaces can be shortened significantly, maintaining a uniform field distribution and high contrast.
