您的位置: 专家智库 > >

国家重点基础研究发展计划(2007CB925002)

作品数:3 被引量:2H指数:1
相关作者:梁学锦潘新宇孟洋陈东敏刘紫玉更多>>
相关机构:中国科学院更多>>
发文基金:国家重点基础研究发展计划国家自然科学基金国家高技术研究发展计划更多>>
相关领域:理学自动化与计算机技术更多>>

文献类型

  • 3篇中文期刊文章

领域

  • 2篇理学
  • 1篇自动化与计算...

主题

  • 1篇PULSE
  • 1篇RESIST...
  • 1篇SWITCH...
  • 1篇XAS
  • 1篇ITO
  • 1篇CO-DOP...
  • 1篇ELECTR...
  • 1篇TRANSP...
  • 1篇SUPERC...
  • 1篇PNICTI...
  • 1篇POLYCR...
  • 1篇HIGH-T...

机构

  • 1篇中国科学院

作者

  • 1篇张培健
  • 1篇刘紫玉
  • 1篇陈东敏
  • 1篇孟洋
  • 1篇潘新宇
  • 1篇梁学锦

传媒

  • 1篇物理学报
  • 1篇Chines...
  • 1篇Scienc...

年份

  • 1篇2012
  • 2篇2010
3 条 记 录,以下是 1-3
排序方式:
Cobalt-doping effects in single crystalline and polycrystalline EuFe_(2-x)Co_xAs_2 compounds被引量:1
2010年
A series of Co-doped EuFe2-xCoxAs2 compounds were prepared in both of single crystalline and polycrystalline forms.The Co-doping effects on the crystal structure,electrical resistivity and magnetic susceptibility were systematically studied.Superconductivity was found in polycrystalline Co-doped samples from zero resistivity effects,with the highest onset superconducting transition temperature at 26 K in the optimum doped EuFe1.84Co0.16As2 compound.While due to the stronger competition between the superconducting order and the Eu2+ magnetic order,the zero resistivity effect is absent in the Co-doped single crystal samples.
CHEN XiaoBoREN ZhiAnDING HongShengLIU LiHua
关键词:HIGH-TCCO-DOPINGSUPERCONDUCTIVITY
缺陷分布对Ag-SiO2薄膜电阻翻转效应的影响
2012年
通过改变制备条件,研究了Ag-SiO_2薄膜中的缺陷对电阻翻转效应的影响.对比不同的热处理实验条件,发现在120℃退火的样品经forming过程后具有稳定的电阻转变特性;另一方面,在Ar/O_2混合气氛下生长的SiO_2具有比在纯Ar下生长的样品更加稳定、重复的电阻转变特性.通过实验分析,表明热处理、电场作用和样品制备气氛可以改变、调节样品中的缺陷分布(Ag填隙原子和氧空位缺陷),从而导致Ag-SiO_2中基于缺陷的导电通道结构的形成和湮灭,提出了提高电阻翻转稳定性的必要条件.
张培健孟洋刘紫玉潘新宇梁学锦陈东敏赵宏武
Enhanced resistance switching stability of transparent ITO/TiO_2/ITO sandwiches被引量:1
2010年
We report that fully transparent resistive random access memory (TRRAM) devices based on ITO/TiO2/ITO sandwich structure, which are prepared by the method of RF magnetron sputtering, exhibit excellent switching stability. In the visible region (400 800 nm in wavelength) the TRRAM device has a transmittance of more than 80%. The fabricated TRRAM device shows a bipolar resistance switching behaviour at low voltage, while the retention test and rewrite cycles of more than 300,000 indicate the enhancement of switching capability. The mechanism of resistance switching is further explained by the forming and rupture processes of the filament in the TiO2 layer with the help of more oxygen vacancies which are provided by the transparent ITO electrodes.
孟洋张培健刘紫玉廖昭亮潘新宇梁学锦赵宏武陈东敏
共1页<1>
聚类工具0