您的位置: 专家智库 > >

中国人民解放军总装备部预研基金(61501050401C)

作品数:4 被引量:0H指数:0
相关作者:黎明徐静波张海英付晓君刘亮更多>>
相关机构:中国科学院微电子研究所中国科学院更多>>
发文基金:中国人民解放军总装备部预研基金中国科学院微电子研究所所长基金国家重点基础研究发展计划更多>>
相关领域:电子电信更多>>

文献类型

  • 4篇中文期刊文章

领域

  • 4篇电子电信

主题

  • 4篇MHEMT
  • 2篇GA
  • 2篇HEMTS
  • 2篇INALAS...
  • 2篇AS
  • 2篇GAAS
  • 2篇METAMO...
  • 1篇电子束光刻
  • 1篇光刻
  • 1篇SPDT
  • 1篇T型栅
  • 1篇MMIC
  • 1篇GATE-L...
  • 1篇MMICS

机构

  • 4篇中国科学院微...
  • 2篇中国科学院

作者

  • 4篇张海英
  • 4篇徐静波
  • 4篇黎明
  • 3篇付晓君
  • 2篇叶甜春
  • 2篇刘亮
  • 1篇李潇
  • 1篇牛洁斌
  • 1篇尹军舰
  • 1篇张健

传媒

  • 3篇Journa...
  • 1篇科学通报

年份

  • 4篇2008
4 条 记 录,以下是 1-4
排序方式:
Power Characteristics of Metamorphic In_(0.52)Al_(0.48)As/In_(0.6)Ga_(0.4)As HEMTs on GaAs Substrates with T-Shaped Gate
2008年
200nm gate-length power InAlAs/InGaAs MHEMTs with T-shaped gate are characterized for DC, RF, and power performance. The MHEMTs show excellent DC output characteristics with an extrinsic transconductance of 510mS/ mm and a threshold voltage of - 1.8V. The fT and fmax obtained for the 0.2μm × 100μm MHEMTs are 138 and 78GHz, respectively. Power characteristics are obtained under different frequencies. When input power (Pin) is - 0. 88dBm (or 2. 11dBm),the MHEMTs exhibit high power characteristics at 8GHz. Output power (Pout) ,associated gain, power added efficiency (PAE) and density of Pout are 4. 05(13.79)dBm,14. 9(11.68)dB,67. 74(75.1)% ,254(239)mW/mm respectively. These promising results are on the path to the application of millimeter wave devices and integrated circuits with improved manufacturability over InP HEMT.
黎明张海英徐静波付晓君
关键词:MHEMTINALAS/INGAAS
200nm Gate Length Metamorphic In_(0.52)Al_(0.48)As/In_(0.6)Ga_(0.4) As HEMTs on GaAs Substrates with 110GHz f_T
2008年
200nm gate-length GaAs-based InAlAs/InGaAs MHEMTs are fabricated by MBE epitaxial material and EBL (electron beam lithography) technology. Ti/Pt/Au is evaporated to form gate metals. A T-shaped gate is produced using a novel PMMA/PMGI/PMMA trilayer resist structure to decrease parasitic capacitance and parasitic resistance of the gate. Excellent DC and RF performances are obtained and the transconductance (gm) ,maximum saturation drain current density (Joss), threshold voltage ( VT), current cut-off frequency (fT) , and maximum oscillation frequency (fmax) of InAlAs/ InGaAs MHEMTs are 510mS/mm,605mA/mm, -1.8V, 110GHz, and 72GHz, respectively.
黎明张海英徐静波付晓君
关键词:MHEMTINALAS/INGAAS
1.0μm Gate-Length GaAs MHEMT Devices and SPDT Switch MMICs
2008年
1.0μm gate-length GaAs-based MHEMTs have been fabricated by MBE epitaxial material and contact-mode lithography technology. Pt/Ti/Pt/Au and Ti/Pt/Au were evaporated to form gate metals. Excellent DC and RF performances have been obtained, and the transconductance, maximum saturation drain current density, threshold voltage, current cut-off frequency,and maximum oscillation frequency of Pt/Ti/Pt/Au and Ti/Pt/Au MHEMTs were 502 (503) mS/mm, 382(530)mA/mm,0.1( - 0.5)V,13.4(14.8)GHz,and 17.0(17.5)GHz,respectively. DC-10GHz single-pole double-throw (SPDT) switch MMICs have been designed and fabricated by Ti/Pt/Au MHEMTs. Insertion loss,isolation,input,and out- put return losses of SPDT chips were better than 2.93,23.34,and 20dB.
徐静波黎明张海英王文新尹军舰刘亮李潇张健叶甜春
关键词:MHEMTSPDTMMIC
利用电子束光刻技术实现200nm栅长GaAs基MHEMT器件
2008年
电子束光刻(electron beam lithography)技术是实现微细栅长的光刻技术之一,利用电子束光刻技术制备出200nm栅长GaAs基MHEMT器件.同时为了减少栅寄生电容和寄生电阻,采用3层胶工艺,实现了T型栅.GaAs基MHEMT器件获得了优越的直流、高频和功率性能,电流增益截止频率和最大振荡频率分别达到105和70GHz,为进一步研究高性能GaAs基MHEMT器件奠定了基础.
徐静波张海英王文新刘亮黎明付晓君牛洁斌叶甜春
关键词:电子束光刻T型栅
共1页<1>
聚类工具0