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国家自然科学基金(61176063)

作品数:13 被引量:5H指数:1
相关作者:张荣谢自力刘斌修向前郑有炓更多>>
相关机构:南京大学南京信息工程大学南京晓庄学院更多>>
发文基金:国家自然科学基金国家重点基础研究发展计划国家高技术研究发展计划更多>>
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13 条 记 录,以下是 1-10
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In-Plane Optical Anisotropy of a-Plane GaN Film on r-Plane Sapphire Grown by Metal Organic Chemical vapour Deposition
2012年
The in-plane optical anisotropic properties of the non-polar a-plane GaN films grown by metal organic chemical vapour deposition are investigated by using polarised photoluminescence(PL),optical transmission and Raman scattering measurements.Through polarised PL and transmission spectra,the in-plane optical anisotropic properties of a-plane GaN film are found,which are attributed to the topmost valance band(atΓpoint)split into three sub-bands under anisotropic strain.The PL spectra also exhibit that the light hole band moves up more rapidly than the spin-orbit crystal-field spilt-off hole band with the increasing in-plane anisotropic compressive strain.Raman scattering spectra under different configurations further indicate the in-plane anisotropy and the hexagonal crystalline structure of these a-plane GaN films.
DING YuLIU BinTAO TaoLI YiZHANG ZhaoZHANG RongXIE Zi-LiZHAO HongGU Shu-LinLV PengZHU Shi-NingZHENG You-Dou
关键词:SCATTERINGVAPOURANISOTROPIC
Influence of Dry Etching Damage on the Internal Quantum Efficiency of Nanorod InGaN/GaN Multiple Quantum Wells
2012年
The influence of dry etching damage on the internal quantum efficiency of InGaN/GaN nanorod multiple quantum wells (MQWs) is studied.The samples were etched by inductively coupled plasma (ICP) etching via a selfassembled nickel nanomask,and examined by room-temperature photoluminescence measurement.The key parameters in the etching process are rf power and ICP power.The internal quantum efficiency of nanorod MQWs shows a 5.6 times decrease substantially with the rf power increasing from 3W to 100W.However,it is slightly influenced by the ICP power,which shows 30% variation over a wide ICP power range between 30W and 600W.Under the optimized etching condition,the internal quantum efficiency of nanorod MQWs can be 40% that of the as-grown MQW sample,and the external quantum efficiency of nanorod MQWs can be about 4 times that of the as-grown one.
YU Zhi-GuoCHEN PengYANG Guo-FengLIU BinXIE Zi-LiXIU Xiang-QianWU Zhen-LongXU FengXU ZhouHUA Xue-MeiHAN PingSHI YiZHANG RongZHENG You-Dou
关键词:INGAN/GANMEASUREMENTEFFICIENCY
无电极光助化学腐蚀法制备GaN微/纳米结构及其物性研究
2015年
利用K2S2O8作为氧化剂,通过无电极光助化学腐蚀GaN外延层制备多种形貌的GaN微米/纳米结构.采用扫描电子显微镜(SEM)、阴极射线发光图(CL mapping)、高分辨X射线衍射(HRXRD)、拉曼光谱(Raman spectra)和光致发光谱(PL)等先进的表征手段研究腐蚀样品的形貌、晶体结构和光学性质.结果表明:在高浓度的KOH(1 mol/L)和低强度的紫外光照下,腐蚀出高质量的腐蚀坑、微米/纳米柱和纳米线;在低浓度KOH(0.4 mol/L)和高强度的紫外光照下,制备出GaN棱锥,研究发现此微米/纳米锥体阵列为包裹了位错的GaN晶体.在腐蚀液KOH浓度低至0.1 mol/L时,GaN腐蚀样品表面形成大量的晶须,聚集成束,晶须揭露了位错;并探讨了多形貌微米/纳米GaN的形成机理.腐蚀温度和GaN外延层极性对腐蚀形貌也具有明显的影响.
张士英修向前徐庆君王恒远华雪梅谢自力刘斌陈鹏韩平陆海顾书林张荣郑有炓
The growth and properties of an m-plane InN epilayer on LiAlO_2 (100) by metal-organic chemical vapor deposition
2012年
The m-plane InN (1 100) epilayers have been grown on a LiAlO2 (1 0 0) substrate by a two-step growth method using a met- al-organic chemical vapor deposition (MOCVD) system. The low temperature InN buffer layer (LT-InN) is introduced to overcome the drawbacks of thermal instability of LiAlO2 (LAO) and to relieve the strains due to a large thermal mismatch be- tween LAO and InN. Then the high temperature m-plane InN (1 1 00) epilayers (HT-InN) were grown. The results of X-ray diffraction (XRD) suggest that the m-plane InN (1 1 00) epilayer is a single crystal. The X-ray rocking curves (co scans) (XRC) and atomic force microscopy (AFM) indicate that the m-plane InN (1 1 00) epilayer has anisotropic crystallographic properties. The PL studies of the materials reveal a remarkable energy band gap structure around 0.70 eV at 15 K.
XIE ZiLiZHANG RongFU DeYiLIU BinXIU XiangQianHUA XueMeiZHAO HongCHEN PengHAN PingSHI YiZHENG YouDou
关键词:INN
氢化物气相外延生长的GaN膜中的应力分析被引量:1
2013年
对在c面蓝宝石上用氢化物气相外延法(HVPE)生长的六方相纤锌矿结构的GaN膜中的应力进行了分析。高分辨X射线衍射(002)面和(102)面摇摆曲线扫描(半高宽数值分别为317和358角秒)表明生长的GaN膜具有较好的晶体质量。利用高分辨X射线衍射技术准确测量了制备的GaN膜的晶格常数,并计算得到GaN膜中面内双轴应变和面外双轴应变分别为3.37×10-4和-8.52×10-4,等静压应变为-7.61×10-5。拉曼光谱和激光光致发光谱测试表明HVPE-GaN外延膜具有较好的光学特性,利用拉曼光谱的E2模式特征峰和激光光致发光谱中近带边发射峰的频移定量计算了外延膜中的面内双轴压应力和等静压应力。两种方法得到的面内双轴压应力较为相符。
刘战辉修向前张李骊张荣张雅男苏静谢自力刘斌单云
关键词:氮化镓氢化物气相外延拉曼光谱应力
GaN hexagonal pyramids formed by a photo-assisted chemical etching method
2014年
A series of experiments were conducted to systematically study the effects of etching conditions on GaN by a con-venient photo-assisted chemical (PAC) etching method. The solution concentration has an evident influence on the surface morphology of GaN and the optimal solution concentrations for GaN hexagonal pyramids have been identified. GaN with hexagonal pyramids have higher crystal quality and tensile strain relaxation compared with as-grown GaN. A detailed anal- ysis about evolution of the size, density and optical property of GaN hexagonal pyramids is described as a function of light intensity. The intensity of photoluminescence spectra of GaN etched with hexagonal pyramids significantly increases compared to that of as-grown GaN due to multiple scattering events, high quality GaN with pyramids and the Bragg effect.
张士英修向前华雪梅谢自力刘斌陈鹏韩平陆海张荣郑有炓
关键词:GAN
氢化物气相外延生长高质量GaN膜生长参数优化研究被引量:1
2013年
系统研究了低温成核层生长时间、高温生长时的V/III比以及生长温度对氢化物气相外延生长GaN膜晶体质量的影响.研究发现合适的低温成核层为后续高温生长提供成核中心,并能有效降低外延膜与衬底间的界面自由能,促进成核岛的横向生长;优化的V/III比和最佳生长温度有利于降低晶体缺陷密度,促进横向生长,增强外延膜的二维生长.利用扫描电子显微镜、原子力显微镜、高分辨X射线衍射、低温光致发光谱和室温拉曼光谱对优化条件下生长的GaN外延膜进行了结构和光电特性表征.测试结果表明,膜表面平整光滑,呈现二维生长模式表面形貌;(002)和(102)面摇摆曲线半高宽分别为317和343 arcsec;低温光致发光谱中近带边发射峰为3.478 eV附近的中性施主束缚激子发射峰,存在11 meV的蓝移,半高宽为10 meV,并且黄带发光强度很弱;常温拉曼光谱中E2(high)峰发生1.1 cm 1蓝移.结果表明,优化条件下生长的GaN外延膜具有良好的晶体质量和光电特性,但GaN膜中存在压应力.
张李骊刘战辉修向前张荣谢自力
关键词:氮化镓氢化物气相外延
GaN电感耦合等离子体刻蚀的优化和损伤分析被引量:1
2012年
通过分别改变电感耦合等离子体(ICP)刻蚀过程中的ICP功率和DC偏压,对ICP刻蚀GaN材料的工艺条件和损伤情况进行了系统的研究。刻蚀后表面的损伤和形貌通过扫描电子显微镜(SEM)、原子力显微镜(AFM)、电子能谱(EDS)、荧光光谱(PL)等技术进行表征和分析。实验结果表明,刻蚀速率随ICP功率和DC偏压的增加而增加;刻蚀损伤与DC偏压成正比,而与ICP功率的关系较为复杂。实验中观测到刻蚀后GaN样品的荧光光谱带边发射峰和黄带发射峰的强度均有明显下降,这意味着刻蚀产生的缺陷中存在非辐射复合中心,并且该非辐射复合中心的密度与DC偏压成正比。为了兼顾高刻蚀速率和低刻蚀损伤,建议使用高ICP功率(>450 W)和低DC偏压(<300 V)进行ICP刻蚀。
滕龙于治国杨濛张荣谢自力刘斌陈鹏韩平郑有炓施毅
关键词:功率
Enhancement in solar hydrogen generation efficiency using InGaN photoelectrode after surface roughening treatment with nano-sized Ni mask
2014年
A significant enhancement in solar hydrogen generation efficiency has been achieved by inductive coupled etching (ICP) surface roughening treatment using nano-sized nickel mask. As much as 7 times improvement of photocurrent is demonstrated in comparison with a planar one fabricated from the same parent wafer. Under identical illumination conditions in HBr solution, the incident photon conversion efficiency (IPCE) shows an enhancement with a factor of 3, which even exceed 54% at 400 nm wavelength. We believe the enhancement is attributed to several facts including improvement in absorption, reacting area, carder localization and carrier lifetime.
陶涛智婷李民雪谢自力张荣刘斌李毅庄喆张国刚蒋府龙陈鹏郑有炓
关键词:PHOTOELECTROLYSIS
Enhanced Light Output of InGaN-Based Light Emitting Diodes with Roughed p-Type GaN Surface by Using Ni Nanoporous Template
2012年
Roughened surfaces of light-emitting diodes(LEDs)provide substantial improvement in light extraction efficiency.By preparing the self-assemble nanoporous Ni template through rapid annealing of a thin Ni film,followed by a low damage dry etching process,a p-side-up LED with a roughened surface has been fabricated.Compared to a conventional LED with plane surface,the light output of LEDs with nanoporous p-GaN surface increases up to 71%and 36%at applied currents of 1 mA and 20 mA,respectively.Meanwhile,the electrical characteristics are not degraded obviously after surface roughening.
YU Zhi-GuoCHEN PengYANG Guo-FengLIU BinXIE Zi-LiXIU Xiang-QianWU Zhen-LongXU FengXU ZhouHUA Xue-MeiHAN PingSHI YiZHANG RongZHENG You-Dou
关键词:ROUGHPREPARINGTEMPLATE
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