The single event effect in ferroelectric-gate field-effect transistor （FeFET） under heavy ion irradiation is investigated in this paper. The simulation results show that the transient responses are much lower in a FeFET than in a conventional metal-oxide-semiconductor field-effect transistor （MOSFET） when the ion strikes the channel. The main reason is that the polarization-induced charges （the polarization direction here is away from the silicon surface） bring a negative surface po- tential which will affect the distribution of carders and charge collection in different electrodes significantly. The simulation results are expected to explain that the FeFET has a relatively good immunity to single event effect.
Bi0.9La0.1Fe0.95Mn0.05O3 （BLFMO） ferroelectric thin films were fabricated on Pt/Ti/SiO2/Si/ substrates by the sol-gel process at different pyrolysis temperatures. The mass loss of BLFMO powder was investigated by thermo gravimetry analyser （TGA）, and the polycrystalline structure and smooth surface of BLFMO thin films were characterized by X-ray diffraction （XRD） and atomic force microscopy （AFM）, respectively. The remnant polarization （Pr） of the BLFMO films pyrolyzed at 420 ℃ is 21.2 μC/cm2 at the coercive field （Ec） of 99 kV/cm and the leakage current density is 7.1×10-3 A/cm2, which indicates that the BLFMO thin films display relatively good ferroelectric property at this temperature.
