Pentacene organic field-effect transistors(OFETs) based on single- or double-layer biocompatible dielectrics of poly(methyl methacrylate)(PMMA) and/or silk fibroin(SF) are fabricated. Compared with those devices based on single PMMA or SF dielectric or SF/PMMA bilayer dielectric, the OFETs with biocompatible PMMA/SF bilayer dielectric exhibit optimal performance with a high field-effect mobility of 0.21 cm2/Vs and a current on/off ratio of 1.5×104. By investigating the surface morphology of the pentacene active layer through atom force microscopy and analyzing the electrical properties, the performance enhancement is mainly attributed to the crystallization improvement of the pentacene and the smaller interface trap density at the dielectric/organic interface. Meanwhile, a low contact resistance also indicates that a good electrode/organic contact is formed, thereby assisting the performance improvement of the OFET.
Development and application of ferrite materials for low temperature co-fired ceramic(LTCC)technology are discussed,specifically addressing several typical ferrite materials such as M-type barium ferrite,NiCuZn ferrite,YIG ferrite,and lithium ferrite.In order to permit co-firing with a silver internal electrode in LTCC process,the sintering temperature of ferrite materials should be less than 950°C.These ferrite materials are research focuses and are applied in many ways in electronics.
A top-contact organic field-effect transistor(OFET) is fabricated by adopting a pentacene/1,1'-bis(di-4tolylaminophenyl) cyclohexane(TAPC) heterojunction structure and inserting an MoO3 buffer layer between the TAPC organic semiconductor layer and the source/drain electrode.The performances of the heterojunction OFET,including output current,field-effect mobility,and threshed voltage,are all significantly improved by introducing the MoO3 thin buffer layer.The performance improvement of the modified heterojunction OFET is attributed to a better contact formed at the Au/TAPC interface due to the MoO3 thin buffer layer,thereby leading to a remarkable reduction of the contact resistance at the metal/organic interface.
VO_2 thin films were grown on silicon substrates using Al_2O_3 thin films as the buffer layers. Compared with direct deposition on silicon, VO_2 thin films deposited on Al_2O_3 buffer layers experience a significant improvement in their microstructures and physical properties. By optimizing the growth conditions, the resistance of VO_2 thin films can change by four orders of magnitude with a reduced thermal hysteresis of 4 °C at the phase transition temperature. The electrically driven phase transformation was measured in Pt/Si/Al_2O_3/VO_2/Au heterostructures. The introduction of a buffer layer reduces the leakage current and Joule heating during electrically driven phase transitions. The C–V measurement result indicates that the phase transformation of VO_2 thin films can be induced by an electrical field.
