The influence of working pressure on microstructure and residual stress evolution of magnetron sputtered ZrN coatings were systemically investigated.XPS and XRD results reveal that all as-deposited coatings at varying working pressure are stoichiometric ZrN with cubic NaCl structure.A decrease in working pressure results in preferred orientation evolution from(111)to(200).This evolution is driven by kinetics processes,such as adatom surface migration and competitive grain growth,rather than by thermodynamic.This explanation is also supported by morphology characterization as the surface and cross-section morphologies transition from tapered shape and columnar structure to round and non-columnar(equiaxed)structure.
In the present work, a series of [FesoNi20-O/SiO2]n multilayer thin films is fabricated using a reactive magnetron sputtering equipment. The thickness of SiO2 interlayer is fixed at 3 nm, while the thickness values of FesoNi20-O magnetic films range from 10 nm to 30 nm. All films present obvious in-plane uniaxial magnetic anisotropy. With increasing the FesoNi20-O layer thickness, the saturation magnetization increases slightly and the coercivity becomes larger due to the enlarged grain size, which could weaken the soft magnetic property. The results of high frequency magnetic permeability characterization show that films with thin magnetic layer are more suitable for practical applications. When the thickness of FesoNi20-O layer is 10 nm, the multilayer film exhibits the most comprehensive high-frequency magnetic property with a real permeability of 300 in gigahertz range.
