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国家重点基础研究发展计划(2011CBA00707)

作品数:28 被引量:62H指数:6
相关作者:赵颖张晓丹陈新亮黄茜魏长春更多>>
相关机构:南开大学河北工业大学中国民航大学更多>>
发文基金:国家重点基础研究发展计划国家高技术研究发展计划国家自然科学基金更多>>
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28 条 记 录,以下是 1-10
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Structural properties of a-SiO_x:H films studied by an improved infrared-transmission analysis method被引量:1
2014年
An improved method of fitting point-by-point is proposed to determine the absorption coefficient from infrared(IR)transmittance. With no necessity of empirical correction factors, the absorption coefficient can be accurately determined for the films with thin thicknesses. Based on this method, the structural properties of the hydrogenated amorphous silicon oxide materials(a-SiOx:H) are investigated. The oxygen-concentration-dependent variation of the Si–O–Si and the Si–H related modes in a-SiOx:H materials is discussed in detail.
王烁张晓丹熊绍珍赵颖
关键词:SIOX红外传输修正因子
A new kind of superimposing morphology for enhancing the light scattering in thin film silicon solar cells: Combining random and periodic structure
2014年
In this article, a new type of superimposing morphology comprised of a periodic nanostructure and a random structure is proposed for the first time to enhance the light scattering in silicon-based thin film solar cells. According to the framework of the Reyleigh–Sommerfeld diffraction algorithm and the experimental results of random morphologies, we analyze the light-scattering properties of four superimposing morphologies and compare them with the individual morphologies in detail. The results indicate that the superimposing morphology can offer a better light trapping capacity, owing to the coexistence of the random scattering mechanism and the periodic scattering mechanism. Its scattering property will be dominated by the individual nanostructures whose geometrical features play the leading role.
Huang Zhen-Hua
关键词:硅太阳能电池散射特性
反应磁控溅射直接生长绒面结构ZnO:Al-TCO薄膜及其特性研究被引量:1
2012年
利用反应磁控溅射技术,在玻璃衬底上直接生长获得了"弹坑状"绒面结构的ZnO:Al-TCO薄膜。通过梯度O2生长(GOG,gradual oxygen growth)方法改善ZnO薄膜的透过率和绒度特性,并且具有较好的电学性能。通过优化实验,GOG方法生长ZnO:Al薄膜(薄膜结构:11.0sccm/10R+9.5sccm/15R)的"弹坑状"特征尺寸为300~500nm,可见光范围透过率达到90%,方块电阻约为4.0Ω/□,电子迁移率为17.4cm2/V-1.s-1。大面积镀制的ZnO:Al具有良好的绒面结构和电学均匀性,可应用于光伏(PV)产业化推广应用。
陈新亮王斐耿新华黄茜张德坤魏长春张晓丹赵颖
关键词:磁控溅射技术ZNO薄膜太阳电池
Improving light trapping and conversion efficiency of amorphous silicon solar cell by modified and randomly distributed ZnO nanorods
2014年
Three-dimensional(3D) nanostructures in thin film solar cells have attracted significant attention due to their applications in enhancing light trapping. Enhanced light trapping can result in more effective absorption in solar cells, thus leading to higher short-circuit current density and conversion efficiency. We develop randomly distributed and modified ZnO nanorods, which are designed and fabricated by the following processes: the deposition of a ZnO seed layer on substrate with sputtering, the wet chemical etching of the seed layer to form isolated islands for nanorod growth, the chemical bath deposition of the ZnO nanorods, and the sputtering deposition of a thin Al-doped ZnO(ZnO:Al) layer to improve the ZnO/Si interface. Solar cells employing the modified ZnO nanorod substrate show a considerable increase in solar energy conversion efficiency.
贾志楠张晓丹刘阳王延峰樊君刘彩池赵颖
关键词:非晶硅太阳能电池纳米棒薄膜太阳能电池
高压射频等离子体增强化学气相沉积制备高效率硅薄膜电池的若干关键问题研究被引量:2
2012年
报道了采用高压射频等离子体增强化学气相沉积(RF-PECVD)制备高效率单结微晶硅电池和非晶硅/微晶硅叠层电池时几个关键问题的研究结果,主要包括:1)器件质量级本征微晶硅材料工艺窗口的确定及其结构和光电性能表征;2)孵化层的形成机理以及减小孵化层的有效方法;3)氢稀释调制技术对本征层晶化率分布及其对提高电池性能的作用;4)高电导、高晶化率的微晶硅p型窗口层材料的获得,及其对减小微晶硅电池p/i界面孵化层厚度和提高电池性能的作用等.在解决上述问题的基础上,采用高压RF-PECVD制备的单结微晶硅电池效率达8.16%,非晶硅/微晶硅叠层电池效率11.61%.
侯国付薛俊明袁育杰张晓丹孙建陈新亮耿新华赵颖
关键词:微晶硅
B掺杂ZnO透明导电薄膜的实验及理论研究被引量:10
2013年
采用脉冲直流磁控溅射技术与基于密度泛函理论的平面波赝势方法对B掺杂ZnO(BZO)薄膜进行了研究.以B2O3:ZnO陶瓷靶为溅射靶材,制备了低电阻率、可见和近红外光区高透过率的BZO薄膜.系统地研究了衬底温度对BZO薄膜的结构、光电特性的影响.结果表明:适当的增加衬底温度可以促进BZO薄膜结晶质量改善,晶粒尺寸增加,迁移率增大,电阻率降低.在200 C时制备了电阻率为7.03×10 4·cm,400—1100 nm平均透过率为89%的BZO薄膜.理论模拟结果表明:在BZO薄膜中,以替位方式掺入的B(BZn)的形成能最低,B主要以替位形式掺入ZnO,其次分别为八面体间隙(BIO)和四面体间隙(BIT)的掺杂方式.B掺入后,费米能级穿过导带,材料表现出n型半导体特性,光学带隙展宽,导电电子主要来源于B 2p,O 2p及Zn 4s电子轨道.
王延峰张晓丹黄茜杨富孟旭东宋庆功赵颖
关键词:第一性原理计算磁控溅射太阳电池
Numerical simulation of a triple-junction thin-film solar cell based on μc-Si_(1-x)Ge_x :H被引量:3
2013年
In this paper, a-Si:H/a-SiGe:H/μc-SiGe:H triple-junction solar cell structure is proposed. By the analyses of microelectronic and photonic structures (AMPS-1D) and our TRJ-F/TRJ-M/TRJ-B tunneling-recombination junction (TRJ) model, the most preferably combined bandgap for this structure is found to be 1.85 eV/1.50 eV/1.0 eV. Using more realistic material properties, optimized thickness combination is investigated. Along this direction, a-Si:H/a-SiGe:H/μc-SiGe:H triple cell with an initial efficiency of 12.09% (Voc = 2.03 V, FF = 0.69, Jsc = 8.63 mA/cm2 , area = 1 cm2 ) is achieved in our laboratory.
黄振华张建军倪牮曹宇胡子阳李超耿新华赵颖
关键词:A-SIH电池结构SIGE
W掺杂ZnO透明导电薄膜的理论及实验研究被引量:8
2012年
本文从理论与实验两方面入手,对高价态差金属W掺杂ZnO(WZO)薄膜材料的特性进行分析讨论.采用基于密度泛函理论的平面波赝势方法对WZO材料特性进行理论分析,计算结果表明:W以替位形式掺入ZnO六角纤锌矿晶格结构中,由于W—O键的键长较长引起晶格常数增加,产生晶格畸变;掺杂后费米能级进入导带,其附近的导电电子主要由W 5d,O 2p及Zn 3d电子轨道提供,材料表现出n型半导体的特性;同时能带简并效应使其光学带隙展宽.为进一步验证该理论分析结果的适用性,本文采用脉冲直流磁控溅射技术进行了本征ZnO及WZO薄膜的实验研究,结果表明:W掺入未改变ZnO的生长方式,但引起薄膜的晶格常数增加,电阻率由本征ZnO的1.35×10^(-2)Ω·cm减小到1.55×10^(-3)Ω·cm,光学带隙由3.27 eV展宽到3.48 eV.制备的WZO薄膜在400-1100 nm的平均透过率大于83%.实验结果对理论计算结果进行了验证,表明WZO薄膜作为透明导电薄膜的应用潜力.
王延峰黄茜宋庆功刘阳魏长春赵颖张晓丹
关键词:第一性原理磁控溅射太阳电池
掺杂PEDOT∶PSS对聚合物太阳能电池性能影响的研究被引量:6
2011年
研究了掺杂后poly(3,4-ethylene dioxythiophene):poly(styrenesulphonic acid)(PEDOT∶PSS)电导率的变化以及掺杂PEDOT∶PSS薄膜对聚合物太阳能电池器件性能的影响.实验发现,向PEDOT∶PSS中掺入极性溶剂二甲基亚砜(DMSO)明显提高了薄膜的电导率,掺杂后的电导率最大值达到1.25S/cm,比未掺杂时提高了3个数量级.将掺杂的PEDOT∶PSS薄膜作为缓冲层应用于聚合物电池(ITO/PEDOT∶PSS/P3HT∶PCBM/LiF/Al)中,发现高电导率的PEDOT∶PSS降低了器件的串联电阻,增加了器件的短路电流,从而提高了器件的性能.最好的聚合物太阳能电池在100mW/cm2的光照下,开路电压(Voc)为0.63V,短路电流密度(Jsc)为11.09mA·cm-2,填充因子(FF)为63.7%,能量转换效率(η)达到4.45%.
郝志红胡子阳张建军郝秋艳赵颖
关键词:电导率聚合物太阳能电池能量转换效率
Effects of annealing rate and morphology of sol–gel derived ZnO on the performance of inverted polymer solar cells
2013年
The effects of annealing rate and morphology of sol–gel derived zinc oxide(ZnO)thin films on the performance of inverted polymer solar cells(IPSCs)are investigated.ZnO films with different morphologies are prepared at different annealing rates and used as the electron transport layers in IPSCs.The undulating morphologies of ZnO films fabricated at annealing rates of 10 C/min and 3 C/min each possess a rougher surface than that of the ZnO film fabricated at a fast annealing rate of 50 C/min.The ZnO films are characterized by atomic force microscopy(AFM),optical transmittance measurements,and simulation.The results indicate that the ZnO film formed at 3 C/min possesses a good-quality contact area with the active layer.Combined with a moderate light-scattering,the resulting device shows a 16%improvement in power conversion efficiency compared with that of the rapidly annealed ZnO film device.
余璇胡子阳黄振华于晓明张建军赵庚申赵颖
关键词:ZNO薄膜快速退火
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