您的位置: 专家智库 > >

国家自然科学基金(50472068)

作品数:16 被引量:32H指数:4
相关作者:胡小波徐现刚李娟蒋民华陈秀芳更多>>
相关机构:山东大学更多>>
发文基金:国家自然科学基金教育部“新世纪优秀人才支持计划”国家高技术研究发展计划更多>>
相关领域:理学电子电信金属学及工艺更多>>

文献类型

  • 16篇中文期刊文章

领域

  • 9篇理学
  • 7篇电子电信
  • 1篇金属学及工艺

主题

  • 5篇6H-SIC
  • 3篇单晶
  • 3篇单晶生长
  • 3篇衬底
  • 2篇带隙
  • 2篇氮化
  • 2篇氮化铝
  • 2篇导体
  • 2篇抛光
  • 2篇量子阱激光器
  • 2篇宽带隙
  • 2篇宽带隙半导体
  • 2篇宽带隙半导体...
  • 2篇机械抛光
  • 2篇激光
  • 2篇激光器
  • 2篇半导体
  • 2篇半导体材料
  • 2篇QUANTU...
  • 2篇ALN

机构

  • 5篇山东大学

作者

  • 5篇徐现刚
  • 5篇胡小波
  • 4篇陈秀芳
  • 4篇蒋民华
  • 4篇李娟
  • 3篇姜守振
  • 3篇宁丽娜
  • 3篇王英民
  • 2篇王继扬
  • 2篇高玉强
  • 1篇李现祥
  • 1篇杨光
  • 1篇彭燕
  • 1篇王翎
  • 1篇王丽

传媒

  • 5篇人工晶体学报
  • 3篇Journa...
  • 2篇Chines...
  • 2篇Journa...
  • 2篇Chines...
  • 1篇稀有金属材料...
  • 1篇Rare M...

年份

  • 1篇2011
  • 1篇2010
  • 1篇2009
  • 1篇2008
  • 5篇2007
  • 7篇2006
16 条 记 录,以下是 1-10
排序方式:
3英寸6H-SiC单晶的生长被引量:1
2007年
王英民宁丽娜陈秀芳彭燕高玉强胡小波徐现刚蒋民华
关键词:单晶生长宽带隙半导体材料蓝色发光二极管电学性质衬底材料
透射电子显微术和高分辨X射线衍射技术研究AlN单晶生长习性被引量:5
2008年
采用透射电子显微术和高分辨X射线衍射技术对氮化硼坩埚中自发成核的AlN单晶生长习性进行了研究。结果表明,在低温下,AlN单晶显露面为(0001)面,随着温度的升高,AlN单晶显露面转化为(112-0)面。沟槽结构是高温下得到的AlN单晶共有的显著特征,其取向沿[0001]方向。
李娟胡小波高玉强王翎徐现刚
关键词:透射电子显微术
Influence of the upper waveguide layer thickness on optical field in asymmetric heterostructure quantum well laser diode被引量:2
2010年
Asymmetric broad-waveguide separate-confinement heterostructure(BW-SCH) quantum well(QW) laser diode emitting at 808 nm is analyzed and designed theoretically.The dependence of the optical field distribution, vertical far-field angle,and internal loss on different thicknesses of the upper waveguide layer is calculated and analyzed.Calculated results show that when the thicknesses of the lower and upper waveguide layers are 0.45 and 0.3μm,respectively,for the devices with 100-μm-wide stripe and 1000-μm-long cavity,an output power of 7.6 W at 8 A,a vertical far-field angle of 37°,a slope efficiency of 1.32 W/A, and a threshold current of 189 mA can be obtained.
李沛旭蒋锴李树强夏伟张新汤庆敏任忠祥徐现刚
关键词:结构层厚度波导光学量子阱激光器
Optical Absorption Measurements on Nitrogen-doped 6H-SiC Single Crystals被引量:1
2007年
6H-SiC bulk crystals have been prepared by sublimation method in an indu-ctively heated growth reactor. The effect of nitrogen doping on absorption for 6H-SiC was investigated. The absorption measurement based on optical method is a non-destructive and non-contact method. The band-gap narrowing with higher doping concentration was observed. For n-type doping below band-gap absorption band at 623 nm for 6H-SiC was observed. The peak intensity of the absorption band increased with increasing charge carrier concentration obtained from Hall measurements. It is also found that the nitrogen doping level decreased in the radial direction and it was the highest at the beginning of growth.
姜守振陈秀芳徐现刚胡小波宁丽娜王英民李娟蒋民华
关键词:光吸收氮元素
Etching Study of SiC Wafers
2006年
SiC substrates grown by the sublimation method still have high densities of structural defects such as dislocations, micropipes, low-angle grain boundaries, macrodefects and polytypes. Wet etching was effectively used to study the defects of SiC. Etch pit shapes of defects and their origins were discussed. Most of the defects originate in the initial growth stage. Thus to optimize the early growth conditions especially the temperature distribution is a crucial problem.
Li Juan Wang Yingmin Chen Xiufang Xu Xiangang Hu Xiaobo Jiang Minhua
关键词:DEFECTSETCHINGSIC
Relaxation of residual stresses in SiC wafers by annealing被引量:1
2006年
Residual stresses in SiC wafers, which were introduced during production processes including sawing, lapping, mechanical polishing (MP), and chemical-mechanical polishing (CMP), were evaluated in terms of changes in radius of curvature and high-resolution X-ray diffractometer (HRXRD) measurements. It was found that annealing was an effective method to reduce stress fields and to improve the wafer flatness. Lapping process generated more residual stresses than other machining processes, and these stresses could be relaxed by thermal treatment. The results showed that annealing was an essential procedure following lapping in the whole production process. The molten KOH etching results accounted for the correlation between the relaxation of stresses and the creation of basal screw dislocations.
CHEN Xiufang XU Xiangang HU Xiaobo LI Juan WANG Yingmin JIANG Shouzhen ZHANG Kai
关键词:残留应力退火机械抛光
2H-SiC Dendritic Nanocrystals In Situ Formation from Amorphous Silicon Carbide under Electron Beam Irradiation
2006年
Under electron beam irradiation, the in-situ formation of 2H-SiC dentritic nanocrystals from amorphous silicon carbide at room temperature was observed. The homogenous transition mainly occurs at the thin edge and on the surface of specimen where the energy obtained from electron beam irradiation is high enough to cause the amorphous crystallizing into 2H-SiC.
Li Xianxiang Hu Xiaobo Jiang Shouzheng Dong Jie Xu Xiangang Jiang Minhua
关键词:BEAMIRRADIATIONDENDRITICAMORPHOUSCARBIDE
Comparison of Different Crucible Materials for the Growth of AlN Crystals
2007年
Choice of crucible material is a key issue during the growth of AlN crystal. The stabilities at high temperature and life-spans of boron nitride (BN) crucible,tantalum (Ta) crucible and tungsten (W) crucible were compared. Tantalum crucible behaved worse at high temperature and life-span was shortened as compared with the other two crucible materials. It was very crisp and easy to crack. In contrast,self-seeded AlN crystals with different morphologies could be obtained at different high temperatures using BN crucible. The boron nitride crucible was stable below 2200 ℃,above which it would decompose. Thus it was unsuitable for the bulky AlN crystal growth. Tungsten crucible could endure the temperatures higher than 2200℃. Unfortunately we could only get AlN polycrystallines using tungsten crucible. After 50~100 hours’ run,the crucible was destroyed completely due to the multiple deep cracks. XRD results of destroyed tungsten crucible indicated that the main phases are tungsten carbide and tungsten nitride.
李娟胡小波王英民宁丽娜姜守振陈秀芳徐现刚王继扬蒋民华
关键词:氮化铝晶体生长
AlN单晶生长研究进展被引量:2
2006年
A lN是一种重要的半导体材料,由于具有宽带隙、高临界击穿电场、高热导率、高载流子饱和漂移速度等优越的特性,在微电子和光电子领域具有广泛的应用前景。本文综述了国际上A lN单晶生长的研究进展,对其结构特点、生长方法的选择、生长过程中的问题及存在的结构缺陷等方面进行了介绍。
李娟胡小波姜守振陈秀芳李现祥王丽徐现刚王继扬蒋民华
关键词:氮化铝
6H-SiC衬底片的表面处理(英文)被引量:5
2007年
相比于蓝宝石,6H-SiC是制作GaN高功率器件更有前途的衬底。本文研究了表面处理如研磨、化学机械抛光对6H-SiC衬底表面特性的影响。用显微镜、原子力显微镜、拉曼光谱、卢瑟福背散射谱表征了衬底表面。结果表明经过两步化学机械抛光后提高了表面质量。经第二步化学机械抛光后的衬底具有优异的表面形貌、高透射率和极小的损伤层,其表面粗糙度RMS是0.12nm。在该衬底上用MOCVD方法长出了高质量的GaN外延膜。
陈秀芳徐现刚胡小波杨光宁丽娜王英民李娟姜守振蒋民华
关键词:6H-SIC衬底表面处理研磨化学机械抛光
共2页<12>
聚类工具0