X-ray supermirror is a non-periodic multilayer structure, whose optical performance is greatly affected by the stability and accuracy of the deposition rate in the fabrication using the direct current （DC） magnetron sputtering. By considering the location-setting time of the substrate positioning above the sputtering target, the deposition rate can be accurately determined. Experimental results show that the optical performance of the supermirror is in agreement with the design aim, which indicates that the layer thickness is well controlled and coincides with the desired ones.
The X-ray low angle reflectivity measurement is used to investigate single and bilayer films to determine the parameters of nanometer-scale structures,three effectual methods are presented by using X-ray reflectivity analysis to provide an accurate estimation of the nanometer film structures. The parameters of tungsten (W) single layer, such as the material density, interface roughness and deposition rate, were obtained easily and speedily. The base metal layer was introduced to measure the profiles of single low Z material film. A 0.3 nm chromium (Cr) film was also studied by low angle reflectivity analysis.
WANG Zhan-shan XU Yao WANG Hong-chang ZHU Jing-tao ZHANG Zhong WANG Feng-li CHEN Ling-yan
